Fabrication and characterization of thermally oxidized TiO2thin films on Si(100) substrates (Record no. 10925)

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040 ## - CATALOGING SOURCE
Original cataloging agency AIKTC-KRRC
Transcribing agency AIKTC-KRRC
100 ## - MAIN ENTRY--PERSONAL NAME
9 (RLIN) 11723
Author Bhatta, Umananda M.
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Title Fabrication and characterization of thermally oxidized TiO2thin films on Si(100) substrates
250 ## - EDITION STATEMENT
Volume, Issue number Vol.57(10), Oct
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Place of publication, distribution, etc. New Delhi
Name of publisher, distributor, etc. CSIR
Year 2019
300 ## - PHYSICAL DESCRIPTION
Pagination 732-736p.
520 ## - SUMMARY, ETC.
Summary, etc. Mixed phase TiO2is known to have better photocatalytic property as the resulting grain boundaries and interfaces between substrate, anatase and rutile phases play a crucial role in transferring/trapping photogenerated electrons. Here we have grown three different thicknesses (10 nm, 30 nm and 50 nm) of Ti thin films on Si(100) substrate in a sputter coater. Thermal oxidation in air at 600 °C for 1 h leads to the formation of mixed phase TiO2thin films. Surface morphology and crystalline quality of thin film are discussed using XRD, SEM and TEM results. Moiré fringes resulting from interfacial strain have been discussed using lattice resolved HRTEM images.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
9 (RLIN) 4642
Topical term or geographic name entry element Humanities and Applied Science
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9 (RLIN) 11724
Co-Author Guha, Puspendu
773 0# - HOST ITEM ENTRY
Place, publisher, and date of publication New Delhi CSIR-NISCAIR
International Standard Serial Number 0019-5596
Title Indian journal of pure & applied physics (IJPAP)
856 ## - ELECTRONIC LOCATION AND ACCESS
URL http://nopr.niscair.res.in/bitstream/123456789/51113/1/IJPAP%2057%2810%29%20732-736.pdf
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          School of Engineering & Technology School of Engineering & Technology Archieval Section 2020-01-15 2020708 2020-01-15 2020-01-15 Articles Abstract Database
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