On optimization of manufacturing of an operational transconductance amplifier based on heterostructures to increase density of their elements: Influence of mismatch-induced stress and porosity of materials on technological process (Record no. 19452)
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| 003 - CONTROL NUMBER IDENTIFIER | |
| control field | OSt |
| 005 - DATE AND TIME OF LATEST TRANSACTION | |
| control field | 20230526093903.0 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 230526b xxu||||| |||| 00| 0 eng d |
| 040 ## - CATALOGING SOURCE | |
| Original cataloging agency | AIKTC-KRRC |
| Transcribing agency | AIKTC-KRRC |
| 100 ## - MAIN ENTRY--PERSONAL NAME | |
| 9 (RLIN) | 19019 |
| Author | Pankratov, E. L. |
| 245 ## - TITLE STATEMENT | |
| Title | On optimization of manufacturing of an operational transconductance amplifier based on heterostructures to increase density of their elements: Influence of mismatch-induced stress and porosity of materials on technological process |
| 250 ## - EDITION STATEMENT | |
| Volume, Issue number | Vol.3(2), Jul-Dec |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | South Africa |
| Name of publisher, distributor, etc. | AkiNik Publications |
| Year | 2022 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Pagination | 7-32p. |
| 520 ## - SUMMARY, ETC. | |
| Summary, etc. | n this paper we introduce an approach to increase density of field-effect transistors in the framework of an operational transconductance amplifier. In the framework of the approach we consider manufacturing the amplifier in heterostructure with specific configuration. Several required areas of the heterostructure should be doped by diffusion or ion implantation. After that dopant and radiation defects should by annealed framework optimized scheme. We also consider an approach to decrease value of mismatch-induced stress in the considered heterostructure. We introduce an analytical approach to analyze mass and heat transport in heterostructures during manufacturing of integrated circuits with account mismatch-induced stress. |
| 650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| 9 (RLIN) | 4623 |
| Topical term or geographic name entry element | Electrical Engineering |
| 773 0# - HOST ITEM ENTRY | |
| Title | International journal of advances in electrical engineering |
| International Standard Serial Number | 2708-4574 |
| Place, publisher, and date of publication | Johannesburg AkiNik Publications |
| 856 ## - ELECTRONIC LOCATION AND ACCESS | |
| URL | https://www.electricaltechjournal.com/article/24/3-1-11-761.pdf |
| Link text | Click here |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| Source of classification or shelving scheme | |
| Koha item type | Articles Abstract Database |
| Withdrawn status | Lost status | Source of classification or shelving scheme | Damaged status | Not for loan | Permanent Location | Current Location | Shelving location | Date acquired | Barcode | Date last seen | Price effective from | Koha item type |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| School of Engineering & Technology | School of Engineering & Technology | Archieval Section | 2023-05-26 | 2023-0869 | 2023-05-26 | 2023-05-26 | Articles Abstract Database |