Low energy ion beam study on Co/CoO thin films
By: Kumar, Deepak
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Contributor(s): Bhattacharyya, A. S.
Publisher: New Delhi NISCAIR 2019Edition: Vol.57(8), Aug.Description: 605-606p.Subject(s): Humanities and Applied ScienceOnline resources: Click here
In:
Indian journal of pure & applied physics (IJPAP)Summary: Computer simulation using SRIM software has been done for ion beam irradiation of different metal ions on Co/CoO thin film which is an FM/AFM system. The films have been experimentally deposited by magnetron sputtering and subjected to low energy ion beams (LEIB) of different energies and fluences. The variation of Si ion energy led to different ion distribution profiles which could be correlated with the morphological changes like dewetting occurring at the surface. Such phenomenon is potentially important for making spintronic devices in future.
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Articles Abstract Database
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School of Engineering & Technology Archieval Section | Not for loan | 2020333 |
Computer simulation using SRIM software has been done for ion beam irradiation of different metal ions on Co/CoO thin film which is an FM/AFM system. The films have been experimentally deposited by magnetron sputtering and subjected to low energy ion beams (LEIB) of different energies and fluences. The variation of Si ion energy led to different ion distribution profiles which could be correlated with the morphological changes like dewetting occurring at the surface. Such phenomenon is potentially important for making spintronic devices in future.
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