000			a
999			_c10925 _d10925
003			OSt
005			20200115121301.0
008			200115b xxu||||| |||| 00| 0 eng d
040			_aAIKTC-KRRC _cAIKTC-KRRC
100			_911723 _aBhatta, Umananda M.
245			_aFabrication and characterization of thermally oxidized TiO2thin films on Si(100) substrates
250			_aVol.57(10), Oct
260			_aNew Delhi _bCSIR _c2019
300			_a732-736p.
520			_aMixed phase TiO2is known to have better photocatalytic property as the resulting grain boundaries and interfaces between substrate, anatase and rutile phases play a crucial role in transferring/trapping photogenerated electrons. Here we have grown three different thicknesses (10 nm, 30 nm and 50 nm) of Ti thin films on Si(100) substrate in a sputter coater. Thermal oxidation in air at 600 °C for 1 h leads to the formation of mixed phase TiO2thin films. Surface morphology and crystalline quality of thin film are discussed using XRD, SEM and TEM results. Moiré fringes resulting from interfacial strain have been discussed using lattice resolved HRTEM images.
650		0	_94642 _aHumanities and Applied Science
700			_911724 _aGuha, Puspendu
773	0		_dNew Delhi CSIR-NISCAIR _x0019-5596 _tIndian journal of pure & applied physics (IJPAP)
856			_uhttp://nopr.niscair.res.in/bitstream/123456789/51113/1/IJPAP%2057%2810%29%20732-736.pdf _yClick here
942			_2ddc _cAR