000			a
999			_c10945 _d10945
003			OSt
005			20200115145101.0
008			200115b xxu||||| |||| 00| 0 eng d
040			_aAIKTC-KRRC _cAIKTC-KRRC
100			_911740 _aVidhya, R.
245			_aInfluence of Cu concentration on the structural, morphological, optical and catalytic properties of TiO2thin films
250			_aVol.57(7), July
260			_aNew Delhi _bCSIR _c2019
300			_a475-482p.
520			_aPristine titanium oxide (TiO2)and Cu doped TiO2thin films of 2.0 μm thicknesses have been deposited on glass substrates by sol-gel dip coating technique. The deposited films are even and more adherent to the substrate. The consequences of incorporation of Cu ions of different concentration in TiO2lattice towards the structural, morphological and optical characteristics of prepared thin films have been investigated.Cu doping alters crystallite size and morphology of doped TiO2films marginally.Gradual increase in concentration of Cu atoms into TiO2matrix expands the absorption window of prepared films to visible region. The decrease in excitonic energy upon Cu doping promotes the charge separation in TiO2semiconductor. Depending upon Cu concentration,exciton life time is extended fairly which leads to improved electron-hole separation and enhanced oxidation-reduction reactions at the surface of TiO2semiconductors.The advantage of thin film catalyst over the other catalyst structures has been exhibited by the reusability nature of Cu-TiO2films.This study reveals that an ideal amount of Cu doping can increase the photocatalytic performance of TiO2thin films efficiently.
650		0	_94642 _aHumanities and Applied Science
700			_911741 _aGandhimathi, R.
773	0		_x0019-5596 _tIndian journal of pure & applied physics (IJPAP) _dNew Delhi CSIR-NISCAIR
856			_uhttp://nopr.niscair.res.in/bitstream/123456789/49498/1/IJPAP%2057%287%29%20475-482.pdf _yClick here
942			_2ddc _cAR