Influence of thermal annealing to material properties of TiO2, ZnO, and TiO 2/ZnO bilayer films by Sol-Gel method (Record no. 17830)

000 -LEADER
fixed length control field a
003 - CONTROL NUMBER IDENTIFIER
control field OSt
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20221021104247.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 221021b xxu||||| |||| 00| 0 eng d
040 ## - CATALOGING SOURCE
Original cataloging agency AIKTC-KRRC
Transcribing agency AIKTC-KRRC
100 ## - MAIN ENTRY--PERSONAL NAME
9 (RLIN) 18435
Author Gareso, Paulus Lobo
245 ## - TITLE STATEMENT
Title Influence of thermal annealing to material properties of TiO2, ZnO, and TiO 2/ZnO bilayer films by Sol-Gel method
250 ## - EDITION STATEMENT
Volume, Issue number Vol.60(3), Mar
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Place of publication, distribution, etc. New Delhi
Name of publisher, distributor, etc. CSIR
Year 2022
300 ## - PHYSICAL DESCRIPTION
Pagination 218-226p.
520 ## - SUMMARY, ETC.
Summary, etc. This study reported on the material properties of TiO2, ZnO, and TiO2/ZnO bilayer thin films fabricated by sol-gel spin
coating technique after annealing. ZnO thin films were prepared by dissolving zinc acetate dehydrated into a solvent of
ethanol and diethanolamine (DEA) was later added. Meanwhile, for TiO2 films, titanium tetraisopropoxide (TTIP) was
dissolved into ethanol and an acetate acid was added. Afterwards all film samples were annealed at different temperatures in
the range of 400 – 600 oC for 60 minutes. For TiO2/ZnO bilayer thin films, the structural properties showed that after
annealing at 600 oC, the X-RD peak intensity was more pronounced compared to at 400 and 500 o
C. This indicated that the
amorphous phase of the films decreased after annealing at 600 o
C. Furthermore, the crystallite sizes of the films increase as
the annealing temperature increased to 600 oC, while the strain reduces at this temperature. In the case of (UV-Vis)
spectroscopy, it was seen that after annealing the transmittance value of the TiO2/ZnO bilayer increase. The band gap energy
of the films consists of low and high energy. The low energy which is around 3.30 eV refers to the transitions of valence-
conduction band in ZnO films and high energy was around 3.60 eV corresponding to the impurity transitions. In addition,
the refractive index (n), the extinction coefficient (k), and the real and imaginary part of dielectric constant were determined
from the transmittance and absorbance spectra results. Based on the SEM results indicate that there was no cluster in the
surface of TiO2/ZnO bilayer thin films.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
9 (RLIN) 4642
Topical term or geographic name entry element Humanities and Applied Sciences
700 ## - ADDED ENTRY--PERSONAL NAME
9 (RLIN) 18436
Co-Author Juarlin, Eko
773 0# - HOST ITEM ENTRY
Place, publisher, and date of publication New Delhi CSIR-NISCAIR
International Standard Serial Number 0019-5596
Title Indian journal of pure & applied physics (IJPAP)
856 ## - ELECTRONIC LOCATION AND ACCESS
URL http://nopr.niscpr.res.in/bitstream/123456789/59496/1/IJPAP%2060%283%29%20218-226.pdf
Link text Click here
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Source of classification or shelving scheme
Koha item type Articles Abstract Database
Holdings
Withdrawn status Lost status Source of classification or shelving scheme Damaged status Not for loan Permanent Location Current Location Shelving location Date acquired Barcode Date last seen Price effective from Koha item type
          School of Engineering & Technology School of Engineering & Technology Archieval Section 2022-10-21 2022-1892 2022-10-21 2022-10-21 Articles Abstract Database
Unique Visitors hit counter Total Page Views free counter
Implemented and Maintained by AIKTC-KRRC (Central Library).
For any Suggestions/Query Contact to library or Email: librarian@aiktc.ac.in | Ph:+91 22 27481247
Website/OPAC best viewed in Mozilla Browser in 1366X768 Resolution.

Powered by Koha